As he says here, the decision not to take risk and jump to EUV with TSMC and Samsung was the mistake that started this downfall and it snowballed. The decision happened somewhere in the pathfinding stage into 10nm. When Gerald Marcyk was running Intel components research back in the 2001 Intel was already considering using EUV lithography for the 45nm technology node that would come out 2007. It turned out that the s…
A lot of people were hoping someone would come up with a better way to make "extreme ultraviolet" (soft x-rays, really) light than the horrible kludge used now.[1] Syncrotrons were tried. (Whatever happened to Lyncean?[2]) What's used now looks like a physics experiment, not a production process. Drops of tin are hit with lasers to emit X-rays, which are then focused with mirrors on the mask and wafer. This takes a s…
[1] https://www.nature.com/news/2008/081022/full/news.2008.1185....