That paper describes a design for a 160 meter ring synchrotron to produce "extreme ultraviolet" for IC fabs in the 7nm and below range. Some large research accelerators have been used for that experimentally, including SLAC at Stanford. So the concept is known to work. It just needs to come down in price and size.
ASML's tin-vaporization light source, which is a mechanical and optical nightmare made to work by throwing a few billion dollars at it, is the current technology.
This may be how China leapfrogs the West in IC technology.