Information to Atoms: DeepEvolve Substrate's lithography speed by 6.8X
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Re: Information to Atoms: DeepEvolve Substrate's lithography speed by 6.8X
#2tl;dr: Google DeepMind's AlphaEvolve improved the speed of Substrate's computational lithography stack by 680% and reduced compute costs by 97%, enabling the simulation and printing of the most demanding layers in advanced semiconductor devices.