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ASML unveils EUV light source advance that could yield 50% more chips by 2030

reuters.com

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Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030

#4

So how small are individual components (e.g., transistors) nowadays? Presumably there's a lower limit: once you're a few atoms across, it seems that you can't go any smaller (?).

This is about increasing output per machine via upgrades.

Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030

#5

So how small are individual components (e.g., transistors) nowadays? Presumably there's a lower limit: once you're a few atoms across, it seems that you can't go any smaller (?).

https://en.wikipedia.org/wiki/2_nm_process

Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030

#6

So how small are individual components (e.g., transistors) nowadays? Presumably there's a lower limit: once you're a few atoms across, it seems that you can't go any smaller (?).

Gates are about 30-50 nm wide, even though they're called '3nm' for marketing reasons.
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