Earlier quoted context omitted.
I didn’t, still don’t, but that’s a lost cause. I’ll note that this video is way out of date…both in content and my skills as a speaker :P
Thanks for the informative presentation!
ASML unveils EUV light source advance that could yield 50% more chips by 2030
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Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030
#92This video is a really cool dive into EUV for the uninitiated (me) https://youtu.be/MiUHjLxm3V0?si=kEPSicC2WXYhcQ6L
The thing I didn't understand after watching that video was why you need such an exotic solution to produce EUV light. We can make lights no problem in the visible spectrum, we can make xray machines easily enough that every doctors office can afford one, what is it specifically about those wavelengths that are so tricky.
The source in the ASML machine produces something like 300-500W of light. With an Xray tube this would then require an electron beam with 50 MW of power. When focused into a microscopic dot on the target this would not work for any duration of time. Even if it did, the cooling and getting rid of unwanted wavelengths would have been very difficult.
A light bulb does not work because it is not hot enough. I suppose some kind of RF driven plasma could be hot enough, but considering that the source needs to be microscopic in size for focusing reasons, it is not clear how one could focus the RF energy on it without also ruining the hardware.
So, they use a microscopic plasma discharge which is heated by the focused laser. It "only" requires a few hundred kilowatts of electricity to power and cool the source itself.
Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030
#93This video is a really cool dive into EUV for the uninitiated (me) https://youtu.be/MiUHjLxm3V0?si=kEPSicC2WXYhcQ6L
+1 for this video, and the Branch education one. Well done to both teams.
Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030
#94Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030
#95Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030
#96Earlier quoted context omitted.
And they’re now going to hit each drop three! times instead of two, and increase to 100,000 drops per second. Very hard to imagine.
If you wrote a science fiction novel around the idea that we make computing devices by blasting fine drops of tin in a vacuum with a laser exactly 3 times at exactly 100,000 drops per second, nobody would believe it. Truth is crazier than fiction.
Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030
#97> SAN DIEGO, California > to help retain the Dutch company's edge over emerging U.S. and Chinese rivals Great news, but what a strange attempt to equate the U.S. and China in this and build a narrative. Cymer was founded in San Diego.
Yeah it's an interesting angle in the article. The EUV light source technology is completely designed, developed, and manufactured by Cymer in California, which is a US company that ASML acquired in 2013. If export control agreements were not in place then ASML would have never been permitted to acquire Cymer. And if they are not enforced then the US would almost certainly require ASML to sell Cymer back to US owners…
Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030
#98End result: the AI industry will get 50% more chips, the rest of us plebs will still be waiting for new GPUs to hit the market... It's impressive to see that there still was so much room left to improve EUV, but I can't help but be royally pissed off that it will be a looooong time before we the people see any practical benefit of it.
This delay is presumably caused by both the lack of production capacity at TSMC, which is busy with AI, and by the fear that any launch of a new CPU would be crippled by the impossibility to buy DRAM and SSDs for new computers.
Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030
#99Earlier quoted context omitted.
All of these problems or equivalent still exist in EUV. Litho industry had to kind of rethink the source and scanner because it went from all lenses to all mirrors in EUV. This is also why low NA and high NA EUV scanners were different phases. As I hear it, the decision had large economic component related to Masks and even OPC.
100%. EUV barely works. XRay litho takes all the issues with EUV and cranks them up to 11. It will take comparable effort to EUV, if not more, to get XRay litho up and running, and I'm not aware of anyone approaching this to anywhere near the level of investment that ASML (and others) have pumped into developing EUV tech. We may get there eventually as a species, but we're a ways off.