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ASML unveils EUV light source advance that could yield 50% more chips by 2030

reuters.com

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Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030

#91
post #69

Earlier quoted context omitted.

I didn’t, still don’t, but that’s a lost cause. I’ll note that this video is way out of date…both in content and my skills as a speaker :P

Thanks for the informative presentation!

thanks for the HN community - the video is how I ended up here and its one of the few social media-esque sites I bother visiting. Taught me a pile of things about coding and CS that weren't in my mechanical engineering degree.

Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030

#92
post #3

This video is a really cool dive into EUV for the uninitiated (me) https://youtu.be/MiUHjLxm3V0?si=kEPSicC2WXYhcQ6L

The thing I didn't understand after watching that video was why you need such an exotic solution to produce EUV light. We can make lights no problem in the visible spectrum, we can make xray machines easily enough that every doctors office can afford one, what is it specifically about those wavelengths that are so tricky.

The efficiency of X-ray tubes is proportional to voltage, and is about 1% at 100kV voltage. This is the ballpark for the garden variety Xray machines. But the wavelength of interest for lithography corresponds to the voltage of only about 100V, so the efficiency would be 10 parts per million.

The source in the ASML machine produces something like 300-500W of light. With an Xray tube this would then require an electron beam with 50 MW of power. When focused into a microscopic dot on the target this would not work for any duration of time. Even if it did, the cooling and getting rid of unwanted wavelengths would have been very difficult.

A light bulb does not work because it is not hot enough. I suppose some kind of RF driven plasma could be hot enough, but considering that the source needs to be microscopic in size for focusing reasons, it is not clear how one could focus the RF energy on it without also ruining the hardware.

So, they use a microscopic plasma discharge which is heated by the focused laser. It "only" requires a few hundred kilowatts of electricity to power and cool the source itself.

Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030

#93
post #3

This video is a really cool dive into EUV for the uninitiated (me) https://youtu.be/MiUHjLxm3V0?si=kEPSicC2WXYhcQ6L

One of those odd moments where a YouTube title looks like clickbait but is actually, factually correct.

+1 for this video, and the Branch education one. Well done to both teams.

Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030

#94

Earlier quoted context omitted.

https://en.wikipedia.org/wiki/2_nm_process

It’s going to be quite funny if they can go below 40nm in gate pitch size, because they’ll need to call it 0nm.

Another marketing gag could be -1nm

Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030

#95
post #17
post #3

This video is a really cool dive into EUV for the uninitiated (me) https://youtu.be/MiUHjLxm3V0?si=kEPSicC2WXYhcQ6L

Or this video, which came out before Veritasium's https://www.youtube.com/watch?v=B2482h_TNwg

Glad to see Branch Education represented here.

Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030

#96
post #90

Earlier quoted context omitted.

And they’re now going to hit each drop three! times instead of two, and increase to 100,000 drops per second. Very hard to imagine.

If you wrote a science fiction novel around the idea that we make computing devices by blasting fine drops of tin in a vacuum with a laser exactly 3 times at exactly 100,000 drops per second, nobody would believe it. Truth is crazier than fiction.

What's even crazier is the technological pursuit of EUV and what a moonshot it was. Chip wars by chris miller chronicles it and it is absolutely crazier than sci fi.

Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030

#97
post #13
post #9

> SAN DIEGO, California > to help retain the Dutch company's edge over emerging U.S. and Chinese rivals Great news, but what a strange attempt to equate the U.S. and China in this and build a narrative. Cymer was founded in San Diego.

Yeah it's an interesting angle in the article. The EUV light source technology is completely designed, developed, and manufactured by Cymer in California, which is a US company that ASML acquired in 2013. If export control agreements were not in place then ASML would have never been permitted to acquire Cymer. And if they are not enforced then the US would almost certainly require ASML to sell Cymer back to US owners…

My understanding based on reading Chip Wars was that Cymer only made the lasers (which are underneath the machine you see in photos). The rest of the mechanism with the tin droplets and cameras and mirrors to aim the lasers etc came from ASML and its other suppliers.

Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030

#98

End result: the AI industry will get 50% more chips, the rest of us plebs will still be waiting for new GPUs to hit the market... It's impressive to see that there still was so much room left to improve EUV, but I can't help but be royally pissed off that it will be a looooong time before we the people see any practical benefit of it.

Yes, and these days both AMD and Intel have announced that their next generation of desktop CPUs, Zen 6 and Nova Lake, which are expected to have very significant improvements over the current CPUs (including much more cores for both and AVX-512 for Intel), have been postponed for next year, instead of being launched this year, as originally planned.

This delay is presumably caused by both the lack of production capacity at TSMC, which is busy with AI, and by the fear that any launch of a new CPU would be crippled by the impossibility to buy DRAM and SSDs for new computers.

Re: ASML unveils EUV light source advance that could yield 50% more chips by 2030

#99

Earlier quoted context omitted.

All of these problems or equivalent still exist in EUV. Litho industry had to kind of rethink the source and scanner because it went from all lenses to all mirrors in EUV. This is also why low NA and high NA EUV scanners were different phases. As I hear it, the decision had large economic component related to Masks and even OPC.

100%. EUV barely works. XRay litho takes all the issues with EUV and cranks them up to 11. It will take comparable effort to EUV, if not more, to get XRay litho up and running, and I'm not aware of anyone approaching this to anywhere near the level of investment that ASML (and others) have pumped into developing EUV tech. We may get there eventually as a species, but we're a ways off.

If you think it barely works now, you should've seen it when we first started. Availability of a machine was "fuck you"% and the whole system was held together by duct tape, bubblegum and hope. Compared to that the current system is entirely controllable.
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