A few highlights from a conversation with a friend who works for Zeiss and regularly deals with ASML (take this with a grain of salt, I may have misunderstood some of it and he also may not be an expert in all of these areas): - The lenses (actually mirrors for EUV) only demagnify by a factor of 4. So your wafer template is already extremely small and costs millions to produce. - 13.5nm is pretty much the smallest wa…
Not entirely correct AFAIK. EUV is something the industry pretty widely worked on, ASML just have the best tech in the end.