As he says here, the decision not to take risk and jump to EUV with TSMC and Samsung was the mistake that started this downfall and it snowballed. The decision happened somewhere in the pathfinding stage into 10nm. When Gerald Marcyk was running Intel components research back in the 2001 Intel was already considering using EUV lithography for the 45nm technology node that would come out 2007. It turned out that the s…
EUV is hard, but isn't part of the reason why only ASML can make those machines because of the CRADA they have with DOE as a member of the EUV LLC? I believe this agreement was why ASML wasn't allowed to sell their solution to China recently. I bet Intel will have no trouble buying EUV to bring in-house - especially if that serves US strategic interests.
IMHO banning sales of ASML's product to China is chest thumping protectionist nonsense - if you're worried about the rise of China's military then you should be tangling their economy up more with that of the West so that they have more reasons not to go to war rather than driving them to be self sufficient.