If the pulses are so short, would it be possible to create an EUV light source from this technology?
Lithography requires the highest possible average intensity, while the pulse length is irrelevant. The laser-driven tin plasma sources used in EUV lithography produce around 7 orders of magnitude more power than the most powerful sources based on high harmonic generation.
I was thinking along the lines of: 1 attosecond corresponds to .3nm, so very short wavelength, so very deep UV.